The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Mar. 05, 2003
Jong-geun Kim, Daejeon, KR;
Sam-min Kim, Daejeon, KR;
Dai-seung Choi, Daejeon, KR;
Jong-hyun Park, Daejeon, KR;
Jong-Geun Kim, Daejeon, KR;
Sam-Min Kim, Daejeon, KR;
Dai-Seung Choi, Daejeon, KR;
Jong-Hyun Park, Daejeon, KR;
Abstract
The present invention relates to a bimodal linear block copolymer containing a tapered block and its manufacturing method. The bimodal linear block copolymer includes a hepta-block copolymer of vinyl aromatic block(PS1)-conjugated diene block(PB1)-tapered block(T1)-vinyl aromatic block(PS2-PS3)-conjugated diene block(PB2)-tapered block(T2)-vinyl aromatic block (PS4), and a tetra-block copolymer of vinyl aromatic block(PS3)-conjugated diene block(PB2)-tapered block(T2)-vinyl aromatic block (PS4) as prepared by adding two charges of an initiator. The bimodal linear block copolymer is prepared by adding several charges of the initiator, vinyl aromatic monomers and conjugated diene monomers to acquire transparency, toughness, rigidity and flexibility, and thereby can be used for sheets or films, or injection or blow molding products.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile