The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Oct. 01, 2003
Applicants:
Ciby Thomas Thuruthiyil, Fremont, CA (US);
Bhanwar Singh, Morgan Hill, CA (US);
Ramkumar Subramanian, Sunnyvale, CA (US);
Inventors:
Ciby Thomas Thuruthiyil, Fremont, CA (US);
Bhanwar Singh, Morgan Hill, CA (US);
Ramkumar Subramanian, Sunnyvale, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2100 ;
U.S. Cl.
CPC ...
Abstract
Real-time analysis and control of a semiconductor silicidation process. The architecture includes system and methods for monitor and control of a silicidation process during rapid thermal anneal. An FTIR system analyzes selected and/or random regions where silicidation is occurring, and signals the process control system to control the process according to the status of the analyzed silicide formations.