The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
May. 26, 2000
James L. Winkler, Palo Alto, CA (US);
Stephen P. A. Fodor, Palo Alto, CA (US);
Christopher J. Buchko, Ann Arbor, MI (US);
Debra A. Ross, Fremont, CA (US);
Lois Aldwin, San Mateo, CA (US);
Douglas N. Modlin, Palo Alto, CA (US);
James L. Winkler, Palo Alto, CA (US);
Stephen P. A. Fodor, Palo Alto, CA (US);
Christopher J. Buchko, Ann Arbor, MI (US);
Debra A. Ross, Fremont, CA (US);
Lois Aldwin, San Mateo, CA (US);
Douglas N. Modlin, Palo Alto, CA (US);
Affymetrix, Inc., Santa Clara, CA (US);
Abstract
A method for producing arrays by depositing a resist on a substrate, selectively removing a portion of the resist to expose localized areas, dispensing a monomer to occupy a localized area of less than 1 cmof the surface of the support, allowing the monomer to bind directly or indirectly to the support and repeating the steps to produce an array of at least 10 different polymers is formed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile