The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Mar. 23, 2001
Takeya Abe, Chiba, JP;
Kiyoshi Ito, Chiba, JP;
Kenju Sasaki, Chiba, JP;
Seiichi Watanabe, Chiba, JP;
Toshihisa Tachibana, Chiba, JP;
Tamotsu Asano, Chiba, JP;
Takeya Abe, Chiba, JP;
Kiyoshi Ito, Chiba, JP;
Kenju Sasaki, Chiba, JP;
Seiichi Watanabe, Chiba, JP;
Toshihisa Tachibana, Chiba, JP;
Tamotsu Asano, Chiba, JP;
Mitsui Chemicals, Inc., Tokyo, JP;
Abstract
The invention is a process for continuously producing an amide compound by reacting a microorganism fungus body containing nitrile hydratase or a processed product of the microorganism fungus body with a nitrile compound in an aqueous medium, characterized in that after contacting said fungus body or said processed product of said fungus body with said nitrile compound in said aqueous medium, a reaction solution thus obtained is further subjected to reaction under conditions having a plug flow region, and according to the invention, an amide compound aqueous solution of a high concentration a high purity can be easily obtained in an extremely high conversion rate of a nitrile compound without a condensation process.