The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Nov. 03, 2001
Applicants:
James F. Cameron, Cambridge, MA (US);
Thomas M. Zydowsky, Worcester, MA (US);
Inventors:
James F. Cameron, Cambridge, MA (US);
Thomas M. Zydowsky, Worcester, MA (US);
Assignee:
Shipley Company, L.L.C., Marlborough, MA (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7038 ; G03F 7039 ; G03F 726 ; G03F 730 ;
U.S. Cl.
CPC ...
Abstract
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that generate an α,α-difluoroalkyl sulfonic acid upon exposure to activating radiation. Positive- and negative-acting chemically amplified resists that contain such PAGs are particularly preferred. The invention also includes methods for synthesis of such PAGs and α,α-difluoroalkyl sulfonic acids.