The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Feb. 21, 2001
Tsutomu Minami, Osakasayama-shi, Osaka 589-0023, JP;
Masahiro Tatsumisago, Sakai, JP;
Kiyoharu Tadanaga, Sakai, JP;
Atsunori Matsuda, Kawachinagano, JP;
Masahiro Hori, Osaka, JP;
Koichiro Nakamura, Osaka, JP;
Hiroaki Yamamoto, Osaka, JP;
Tsutomu Minami, Osakasayama-shi, Osaka 589-0023, JP;
Masahiro Tatsumisago, Sakai, JP;
Kiyoharu Tadanaga, Sakai, JP;
Atsunori Matsuda, Kawachinagano, JP;
Masahiro Hori, Osaka, JP;
Koichiro Nakamura, Osaka, JP;
Hiroaki Yamamoto, Osaka, JP;
Nippon Sheet Glass Co., Ltd., Osaka, JP;
Other;
Abstract
An article with a predetermined surface pattern that is coated with a film which makes possible the complete transfer of the pattern of a patterning die and thick-film patterning having a depth to the order of several tens of micrometers, prevents the occurrence of cracks, has high film hardness, and has a surface pattern which is the inverse of the surface pattern of the patterning die. This article is produced by joining a patterning die closely to a substrate with a sol-gel material containing the silane compound represented by the formula: RSiX(wherein Ris an alkyl group or hydrogen and X is an alkoxyl group or a halogen atom) and the silane compound represented by the formula: RSiY(wherein Ris an aryl group or a substituted aryl group and Y is an alkoxyl group or a halogen atom) disposed therebetween in the form of a film and heating them to coat the surface of the substrate with a gel film having a surface pattern which is the inverse of the surface pattern of the patterning die.