The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Mar. 28, 1997
Lance Cleveland, San Diego, CA (US);
Lance Cleveland, San Diego, CA (US);
Other;
Abstract
Two printing-medium guide systems restrain the medium. One is in an area upstream (along the direction of medium advance) from the pen, and extending laterally across the width of the medium except in one or more regions that are laterally near the engagement of a print-medium advancing device. The other guide system is disposed laterally from the pen, and extends laterally across the medium only in one or more regions that are laterally near the engagement of the advancing device. Preferably a human-actuable control selects a print-medium width, and shifts at least one bifurcation of the second guide system. A tensioning system, longitudinally beyond the marking head from the medium advancing device, and generally aligned laterally with that device, tensions the medium away from the advancing device to hold the medium taut at the pen. Preferably the advancing and tensioning devices are very closely spaced upstream and downstream, respectively, from the pen operating zone. When tensioned, the medium moves a normal distance through the apparatus at each operation of the advancing device; but after a trailing edge of the medium passes the advancing device (so that the medium is advanced only by the tensioner and is no longer tensioned), the advance distance is decreased (preferably by about half).