The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2005
Filed:
Jun. 15, 2001
John Jacob Ottusch, Malibu, CA (US);
Stephen M. Wandzura, Agora Hills, CA (US);
Harry F. Contopanagos, Santa Monica, CA (US);
John F. Visher, Maibu, CA (US);
Vladimir Rokhlin, Santa Monica, CT (US);
John Jacob Ottusch, Malibu, CA (US);
Stephen M. Wandzura, Agora Hills, CA (US);
Harry F. Contopanagos, Santa Monica, CA (US);
John F. Visher, Maibu, CA (US);
Vladimir Rokhlin, Santa Monica, CT (US);
HRL Laboratories, LLC, Malibu, CA (US);
Abstract
A computer program product, an apparatus, and a method for modeling equivalent surface sources on a closed, arbitrarily shaped object that result from the imposition of an arbitrary time-harmonic incident field (e.g., a radar wave) are provided. An object divided into by a plurality of patchesand parameters for the incident field and the properties of the objectare provided to the system. Next, the system produces a discretized representation of a well-conditioned boundary integral equation in the form of a well-conditioned matrix equation, modeling the interaction between the incident field and the object. The well-conditioned linear system is solved numerically to determine equivalent surface sources on the object. The equivalent sources may then be used to determine electromagnetic fields resulting therefrom. The invention provides improved computational efficiency as well as increased modeling accuracy by effectively reducing the numerical precision necessary.