The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2005
Filed:
May. 20, 2002
Eric G. Oettinger, Rochester, MN (US);
Mark D. Heminger, Rochester, MN (US);
Eric G. Oettinger, Rochester, MN (US);
Mark D. Heminger, Rochester, MN (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A method of moving a MEM system mirror in a well defined trajectory that allows longer seeks to be used to reach a target position as compared with known methods that employ small step sizes due to lack of well defined seek trajectories. One method uses the same seek trajectory (scaled in amplitude for seek length) for both axes (x-axis and y-axis) associated with the MEM mirror. This forces both axes to take the same length of time and to use the same 'shape' to perform the move, and results in a straight line path between two points. Multiple straight line moves can be employed to provide a more complex trajectory. Another method uses a different trajectory with the same length, but a different shape, for each axis to force the MEM mirror along substantially any desired path such as an arc and/or straight line, among others.