The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2005
Filed:
Apr. 26, 2002
Leisa B. Davenhall, Santa Fe, NM (US);
James B. Rubin, Los Alamos, NM (US);
Craig M. V. Taylor, Jemez Springs, NM (US);
Leisa B. Davenhall, Santa Fe, NM (US);
James B. Rubin, Los Alamos, NM (US);
Craig M. V. Taylor, Jemez Springs, NM (US);
The Regents of the University of California, Los Alamos, NM (US);
Abstract
Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile