The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2005
Filed:
Feb. 27, 2003
Osamu Ide, Kanagawa, JP;
Osamu Ide, Kanagawa, JP;
Fuji Xerox Co., Ltd., Tokyo, JP;
Abstract
An image structure formed on a medium. The image structure is so formed that an angular distribution of surface reflection light beams under the condition that a surface of an image G formed on a medium is irradiated with a slit-transmitted light beam satisfies the following three characteristics: (1) an angle A corresponding to a half value of a reflected light peak is not smaller than unity but not larger than twice as large as a reference angle A; (2) the ratio ΔXWS/ΔXWSof the value of WS of center-of-gravity fluctuation to the value of reference WSof center-of-gravity fluctuation is not larger than 10; and (3) an angle B at which the quantity of reflected light becomes {fraction (1/10)} as large as the peak value is in a range of from 3×Ato 6×A, both inclusively.