The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2005
Filed:
Oct. 15, 2002
Syogo Narukawa, Shinjuku-ku, JP;
Kiyoshi Yamazaki, Shinjuku-ku, JP;
Hideyuki Nara, Shinjuku-ku, JP;
Yuji Machiya, Shinjuku-ku, JP;
Tatsuya Tomita, Shinjuku-ku, JP;
Syogo Narukawa, Shinjuku-ku, JP;
Kiyoshi Yamazaki, Shinjuku-ku, JP;
Hideyuki Nara, Shinjuku-ku, JP;
Yuji Machiya, Shinjuku-ku, JP;
Tatsuya Tomita, Shinjuku-ku, JP;
Abstract
A photomask with a dummy pattern is inspected in a predetermined detection sensitivity by using photomask pattern data designating a photomask with a dummy pattern to detect defects in the photomask. Coordinates indicating the positions of the defects are also determined. The defects in a design pattern area and those in a dummy pattern area are discriminated by using defect-discriminating data. The defects in the design pattern area and those in the dummy pattern area are examined on the basis of respective inspection specifications.