The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2005
Filed:
Jun. 29, 2001
Masayoshi Wada, Yokohama, JP;
Asa Kimura, Yokohama, JP;
Masayoshi Wada, Yokohama, JP;
Asa Kimura, Yokohama, JP;
Shiseido Co., Ltd., Tokyo, JP;
Abstract
The purpose of the invention is to provide a forgery/alteration protective material which containing a retroreflecting material and having an improved forgery/alteration protecting effect against the process of the upper part of the material. In order to achieve the above purpose, the forgery/alteration protective materialaccording to the invention where a retroreflecting materialfor returning the incident light substantially along the path along which the incident light travels is provided and a transparent filmis layered on the retroreflecting materialis characterized in that a low transmittance layerformed of a material having a lowerer light transmittance than that of the transparent filmis provided between the retroreflecting materialand the transparent film layer, and the light transmittance of the low transmittance layeris 45% or higher to the light in the wavelength range of 420 nm to 700 nm.