The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2005
Filed:
Jul. 30, 2002
Dustin W Carr, Pittstown, NJ (US);
Christopher John Frye, Orefield, PA (US);
Timofei Nikita Kroupenkine, Warren, NJ (US);
Victor Alexander Lifton, Bridgewater, NJ (US);
Michael Patrick Schlax, Davenport, IA (US);
Alex T Tran, Madison, NJ (US);
Joseph J Vuillemin, Newton Upper Falls, MA (US);
Dustin W Carr, Pittstown, NJ (US);
Christopher John Frye, Orefield, PA (US);
Timofei Nikita Kroupenkine, Warren, NJ (US);
Victor Alexander Lifton, Bridgewater, NJ (US);
Michael Patrick Schlax, Davenport, IA (US);
Alex T Tran, Madison, NJ (US);
Joseph J Vuillemin, Newton Upper Falls, MA (US);
Lucent Technologies Inc., Murray Hill, NJ (US);
Agere Systems Inc., Allentown, PA (US);
Abstract
A multilayer micromirror structure that exhibits substantially no form change as a result of a given change in temperature is disclosed. A reflective layer is disposed on a substrate layer, and a counterbalancing structure is disposed on the structure in a way such that a neutral plane is located at a predetermined position relative to the substrate layer and the reflective layer. When forces are exerted at the neutral plane of such a structure, the structure attains a predetermined geometric form. A method of manufacture is disclosed wherein a substrate is etched to define a desired structure and a conformal layer of a masking material is deposited onto the etched substrate. Further etching exposes portions of the substrate and silicon is deposited to achieve another desired structure. Excess material is etched away to free the finished structure and a reflective layer is deposited onto the surface of the structure.