The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 2005

Filed:

Aug. 14, 2002
Applicants:

Vincent Mark Byrne, Mesquite, TX (US);

Roosevelt O'brian Carr, Plano, TX (US);

Dibyendu Narayan Nath, Plano, TX (US);

Paul Scott Nessman, Mesquite, TX (US);

Inventors:

Vincent Mark Byrne, Mesquite, TX (US);

Roosevelt O'brian Carr, Plano, TX (US);

Dibyendu Narayan Nath, Plano, TX (US);

Paul Scott Nessman, Mesquite, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 114 ; H05K 714 ; H05K 718 ;
U.S. Cl.
CPC ...
Abstract

A system is configured for installing a replaceable component at a replaceable component locus in an equipment cabinet having a front and back plane and a plurality of sides. A fixed component occupies a first volume that establishes a replaceable component volume between the first volume and the back plane. The system includes: (a) a substrate supporting the replaceable component that presents substantially parallel first and second edges in a substrate plane; and (b) a guide structure fixed with the cabinet that cooperates with the substrate to slidingly move the substrate along a replacement route between the front plane and a replacement locus in the replaceable component volume in alternate first and second installation movements. The first installation movement is responsive to a first installation force applied to the substrate in the substrate plane. The second installation movement is responsive to a second installation force applied generally perpendicular with the substrate plane.


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