The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2005
Filed:
Oct. 31, 2002
Brian Rusnak, Livermore, CA (US);
James M. Hall, Livermore, CA (US);
Stewart Shen, Danville, CA (US);
Richard L. Wood, Santa Fe, NM (US);
Brian Rusnak, Livermore, CA (US);
James M. Hall, Livermore, CA (US);
Stewart Shen, Danville, CA (US);
Richard L. Wood, Santa Fe, NM (US);
The United States of America as represented by the United States Department of Energy, Washington, DC (US);
Abstract
A rotating aperture system includes a low-pressure vacuum pumping stage with apertures for passage of a deuterium beam. A stator assembly includes holes for passage of the beam. The rotor assembly includes a shaft connected to a deuterium gas cell or a crossflow venturi that has a single aperture on each side that together align with holes every rotation. The rotating apertures are synchronized with the firing of the deuterium beam such that the beam fires through a clear aperture and passes into the Xe gas beam stop. Portions of the rotor are lapped into the stator to improve the sealing surfaces, to prevent rapid escape of the deuterium gas from the gas cell.