The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2005
Filed:
Dec. 06, 2002
David J. Nelson, Rochester, NY (US);
Suresh Sunderrajan, Rochester, NY (US);
Ramesh Jagannathan, Rochester, NY (US);
Seshadri Jagannathan, Pittsford, NY (US);
Glen C. Irvin, Jr., Rochester, NY (US);
Sridhar Sadasivan, Rochester, NY (US);
Rajesh V. Mehta, Rochester, NY (US);
John E. Rueping, Rochester, NY (US);
David J. Nelson, Rochester, NY (US);
Suresh Sunderrajan, Rochester, NY (US);
Ramesh Jagannathan, Rochester, NY (US);
Seshadri Jagannathan, Pittsford, NY (US);
Glen C. Irvin, Jr., Rochester, NY (US);
Sridhar Sadasivan, Rochester, NY (US);
Rajesh V. Mehta, Rochester, NY (US);
John E. Rueping, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A system () produces patterned deposition on a substrate () from compressed fluids. A delivery system () cooperates with an independently controlled first chamber and an independently controlled second chamber retaining a substrate () for receiving precipitated functional material along a fluid flow delivery () from the delivery system (). A shadow mask () is arranged in close proximity to the substrate () for forming the patterned deposition on the substrate ().