The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 2005

Filed:

Jan. 08, 2002
Applicants:

Robert Peterson, Pittsburgh, PA (US);

James C. Hobson, West Bloomfield, MI (US);

Mikhail V. Novikov, Oakmont, PA (US);

Inventors:

Robert Peterson, Pittsburgh, PA (US);

James C. Hobson, West Bloomfield, MI (US);

Mikhail V. Novikov, Oakmont, PA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01D 542 ;
U.S. Cl.
CPC ...
Abstract

An apparatusfor producing one or more characterizing measurements of a surfacein relation to a repeatedly reproducible datum axis A-A, the apparatuscomprising a probea first porous surfacelocated on the probethe first porous surfacebeing in communication with a first source of fluid pressurethe first porous surfacebeing located proximate to opposing wallsthat defines a volumeso that a non-contacting fluid pressure gapis formed between the first porous surfaceand the wallsthe first porous surfacedefining the datum axis A-A; at least one second porous surfacelocated on the probethe at least one second porous surfacebeing in communication with a second source of fluid pressurethe at least one second porous surfacebeing located in a cooperative relationship with the surfaceto be measured, so that a non-contacting fluid pressure gapis fanned between the at least one second porous surfaceand the surface to be measured; and means for generating one or more characterizing measurements of the surface to be measured in relation to the datum axis.


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