The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Sep. 14, 2001
Louay Eldada, Acton, MA (US);
Louay Eldada, Acton, MA (US);
E. I. du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
A method for making an apodized Bragg grating in a photosensitive, planar, linear waveguide. A photosensitive, planar, linear waveguide is provided on a surface of a substrate. A patterned phase mask is placed between the waveguide and a laser beam. The waveguide is exposed through the phase mask to the laser beam wherein either the laser beam is moving at a substantially constant velocity with respect to the substrate and phase mask, or the substrate and phase mask are moving at a substantially constant velocity with respect to the laser beam. The beam has a smoothly varying intensity profile, and the exposure is conducted at an angle of more than 0° and less than 90° to the longitudinal axis of the waveguide under conditions sufficient to induce a modulation in the index of refraction of the waveguide and impart an apodized Bragg grating in the waveguide corresponding to the phase mask pattern.