The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2005

Filed:

Mar. 23, 2001
Applicants:

Shih-jong J. Lee, Bellevue, WA (US);

Seho OH, Mukilteo, WA (US);

Larry A. Nelson, Seattle, WA (US);

Inventors:

Shih-Jong J. Lee, Bellevue, WA (US);

Seho Oh, Mukilteo, WA (US);

Larry A. Nelson, Seattle, WA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 900 ; G06K 962 ; G06K 936 ; H04N 100 ;
U.S. Cl.
CPC ...
Abstract

Mark detection and position determination are improved by use of directional elongated filters, symmetry, gray scale image processing, structural constraints, and learning. Directional elongated filters are used to pre-process images of registration marks to create masks and enhanced images. Working sequentially, portions of the mark are detected and classified. The input gray scale image of the mark is processed using its structural constraints in conjunction with a mask for the detected mark. A cost function estimation determines mark position and orientation with sub-pixel accuracy. Learning is used to improve specific application performance.


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