The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Nov. 27, 2002
Applicants:
Manabu Takakuwa, Yokkaichi, JP;
Keita Asanuma, Yokohama, JP;
Tatsuhiko Higashiki, Fujisawa, JP;
Inventors:
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03B 2732 ; G03B 2742 ; G03B 2768 ;
U.S. Cl.
CPC ...
Abstract
Lens distortion correction is characterized by obtaining a correction parameter by using the difference between the latest QC data used when exposing a overlaying layer and the latest QC data used when exposing a overlaid layer.
Takakuwa, Manabu. (2005). Exposing method (U.S. Patent No. 6842230). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6842230
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile