The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2005

Filed:

Oct. 25, 2002
Applicants:

Geun Su Lee, Kyoungki-do, KR;

Jae Chang Jung, Kyoungki-do, KR;

Ki Soo Shin, Seoul, KR;

Inventors:

Geun Su Lee, Kyoungki-do, KR;

Jae Chang Jung, Kyoungki-do, KR;

Ki Soo Shin, Seoul, KR;

Assignee:

Hynix Semiconductor Inc., Kyoungki-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 732 ; C11D 750 ;
U.S. Cl.
CPC ...
Abstract

Cleaning solutions for removing photoresist materials and a method of forming underlying layer patterns of semiconductor devices using the same. The cleaning solutions for removing photoresist include a solvent mixture of HO and an organic solvent, an amine compound, a transition metal-removing material and an alkali metal-removing material, and may further include a hydrazine hydrate.


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