The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Nov. 08, 2001
Applicants:
Sharmin Sadoughi, Cupertino, CA (US);
Krishnaswamy Ramkumar, San Jose, CA (US);
Inventors:
Sharmin Sadoughi, Cupertino, CA (US);
Krishnaswamy Ramkumar, San Jose, CA (US);
Assignee:
Cypress Semiconductor Corporation, San Jose, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2131 ;
U.S. Cl.
CPC ...
Abstract
A process for fabricating a semiconductor structure comprises depositing a nitride layer on a semiconductor substrate with a first tool, and depositing an anti-reflective layer on the semiconductor substrate with the first tool. The nitride layer includes silicon and nitrogen.
Quick Actions:
Sadoughi, Sharmin. (2005). In situ deposition of a nitride layer and of an anti-reflective layer (U.S. Patent No. 6841491). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6841491
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile