The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Oct. 07, 2002
John Chien, Buena Park, CA (US);
Robert C. Platt, Jr., Laguna Niguel, CA (US);
Anthony Lemus, Villa Park, CA (US);
John Chien, Buena Park, CA (US);
Robert C. Platt, Jr., Laguna Niguel, CA (US);
Anthony Lemus, Villa Park, CA (US);
Ethicon, Inc., Somerville, NJ (US);
Abstract
A sterilization system applies power to a plasma within a chamber to remove gas or vapor species from an article. The sterilization system includes a power feedback control system for controlling the power applied to the plasma. The power feedback control system includes a current monitor adapted to produce a first signal indicative of a current applied to the plasma within the chamber. The power feedback control system further includes a voltage monitor adapted to produce a second signal indicative of a voltage applied to the plasma within the chamber. The power feedback control system further includes a power control module comprising a programmable digital signal processor. The digital signal processor is adapted to receive and process the first signal and the second signal by multiplying the current and the voltage and producing a third signal indicative of the product of the current and the voltage. The power feedback control system further includes a plasma generator coupled to the power control module and adapted to adjust, in response to the third signal, the power applied to the plasma within the chamber.