The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Jul. 17, 2000
Walter G. Branco, San Jose, CA (US);
Jianmiu Qiao, Fremont, CA (US);
Walter G. Branco, San Jose, CA (US);
Jianmiu Qiao, Fremont, CA (US);
Cypress Semiconductor Corporation, San Jose, CA (US);
Abstract
A method for cleaning a plasma reactor clamber part () may include dipping the chamber part in a solvent () that may dissolve a material that has been redistributed on the chamber part by a reactive plasma. A chamber part may then be rinsed (), ultrasonically cleaned () in a ultrasonic cleaning liquid, and then rinsed again with a liquid that may evaporate at a lower temperature than an ultrasonic cleaning liquid (). A chamber part may then be blown dry () and baked (). In addition, or alternatively, a method may also include plasma cleaning a chamber part ().