The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2005

Filed:

Apr. 05, 2002
Applicants:

Ismail Kashkoush, Orefield, PA (US);

Richard Novak, Plymouth, MN (US);

Tom Mancuso, Allentown, PA (US);

Jim Vadimsky, New Tripoli, PA (US);

Inventors:

Ismail Kashkoush, Orefield, PA (US);

Richard Novak, Plymouth, MN (US);

Tom Mancuso, Allentown, PA (US);

Jim Vadimsky, New Tripoli, PA (US);

Assignee:

Akrion LLC, Allentown, PA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B08B 704 ;
U.S. Cl.
CPC ...
Abstract

A process tank for processing a plurality of wafers having a diameter, the process tank comprising: two substantially vertical side walls being a first distance apart; wherein the first distance is substantially equal to the diameter of the wafer; two upwardly angled walls positioned between the side walls; a first transducer array coupled to a first of the upwardly angled walls, the first transducer array extending a length less than the diameter of the wafer; and a second transducer array coupled to a second of the upwardly angled walls, the second transducer array extending a length less than the diameter of the wafer. It is preferred that the process tank further comprise a fluid inlet positioned between the upwardly angled walls. In another aspect, the invention is a method of processing wafers comprising: filling the process tank described above with a wafer processing liquid through the tank inlet; submerging a wafer carrier holding a plurality wafers into the tank; and applying megasonic energy to the liquid through the first and second transducer arrays for a predetermined time and in a predetermined pattern.


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