The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2005

Filed:

Mar. 02, 1998
Applicants:

Hisashi Ohde, Hachioji, JP;

Yasuhiro Kamihara, Hino, JP;

Inventors:

Hisashi Ohde, Hachioji, JP;

Yasuhiro Kamihara, Hino, JP;

Assignee:

Olympus Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 518 ;
U.S. Cl.
CPC ...
Abstract

A relief type diffraction optical element including a substrate made of an optical material, said substrate having formed on its surface a non-even width relief pattern which include a first zone group consisting of at least one zone whose cross sectional configuration is formed by a curvilinear portion which follows a phase shift function or at least two rectilinear portions which approximates the phase shift function, and a second zone group consisting of a plurality of zones each having a single rectilinear portion approximating the phase shift function.


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