The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2005
Filed:
Dec. 26, 2002
Yoshinori Kobayashi, Tokyo, JP;
Shigetomo Ishibashi, Tokyo, JP;
Masato Hara, Tokyo, JP;
PENTAX Corporation, Tokyo, JP;
Abstract
A projection aligner scans a plurality of light beams over a mask in a main scanning direction to transfer an image of a mask pattern on an object by the light beams passed through the mask. The projection aligner has a plurality of optical systems for projecting light beams passed through the mask onto the object. Each of the optical system includes a lens unit, a reflector provided to one side of the lens unit and a deflector provided to the other side of the lens unit. The light beam passed through the mask is deflected by the deflector, passes through the lens unit, reflected back by the reflector, passes through the lens unit again, and deflected by the deflector toward the object. The size of the image formed by the light beam is varied by moving the reflector in the main scanning direction and moving the deflector in a direction perpendicular to the object. The location of the image on the object in the auxiliary direction is adjusted by further moving the reflector in the auxiliary direction.