The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2005
Filed:
Jul. 31, 2001
Teruji Ikematsu, Kanagawa, JP;
Teruji Ikematsu, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
The present invention relates to a method for controlling exposure and a scan-exposure apparatus, which are used when a photosensitive material is scan-exposed. In the present invention, distance between a light source and a recording medium can be controlled on the basis of pre-measured distance correction data and timing at which light is emitted from the light source can be controlled on the basis of pre-measured light-emission correction data. Accordingly, it becomes possible to prevent the light beam irradiates the recording medium from going out of focus and to reduce the amount by which the position irradiated with the light beam deviates from a preset standard position.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile