The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2005
Filed:
May. 29, 2003
Device and method for detecting alignment of deep trench capacitors and active areas in dram devices
Tie-jiang Wu, Ilan, TW;
Chien-chang Huang, Banchiau, TW;
Bo-ching Jiang, Hualien, TW;
Yu-wei Ting, Taipei, TW;
Tie-Jiang Wu, Ilan, TW;
Chien-Chang Huang, Banchiau, TW;
Bo-Ching Jiang, Hualien, TW;
Yu-Wei Ting, Taipei, TW;
Nanya Technology Corporation, Taoyuan, TW;
Abstract
A test device and method for detecting alignment of deep trench capacitors and active areas in DRAM devices. A quadrilateral active area is disposed in the scribe line region, with four equilaterals and four vertex angles. Parallel first and second deep trench capacitors are disposed in the quadrilateral active area. The first deep trench capacitor has a first surface aligned with a second surface of the second deep trench capacitor. The first and second vertex angles of the four vertex angles have a diagonal line essentially perpendicular to the first and second surfaces. The first and second vertex angles are a predetermined distance from the first surface and the second surface respectively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile