The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2005
Filed:
Mar. 29, 2002
Hongying Wang, Fremont, CA (US);
Neil Deeman, Alamo, CA (US);
Koichi Wago, Sunnyvale, CA (US);
Nobuo Kurataka, Campbell, CA (US);
HongYing Wang, Fremont, CA (US);
Neil Deeman, Alamo, CA (US);
Koichi Wago, Sunnyvale, CA (US);
Nobuo Kurataka, Campbell, CA (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
A system and method for forming servo patterns on magnetic media is disclosed. A magnetic film coated with a layer of polystyrene is stamped with a nickel stamper reproducing the negative image of the stamped pattern on the polystyrene. Ions are then accelerated towards the surface of the polystyrene, which stopps the ions in the areas where the polystyrene is thick and allows the ions to penetrate through to the magnetic layer in the areas where the polystyrene is thin. The ions, which penetrate through to the magnetic layer, interact with the magnetic layer altering the magnetic layer's structure reducing its coercivity (Hc) and remnant moment (Mrt). This reproduces the stamped polystyrene pattern on the magnetic layer. The polystyrene is then removed by oxygen plasma etching the surface leaving behind a patterned magnetic media.