The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2005
Filed:
Jul. 23, 2002
Richard J. Kasica, Knoxville, TN (US);
Anthony Novembre, Martinsville, NJ (US);
Richard J. Kasica, Knoxville, TN (US);
Anthony Novembre, Martinsville, NJ (US);
Agere Systems Inc., Allentown, PA (US);
Abstract
A process for fabricating a mask, including depositing a membrane layer on a substrate, etching a backside of the substrate to form membrane windows, depositing at least one scattering layer on the membrane layer depositing a mask layer on the at least one scattering layer exposing the mask layer corresponding to membrane windows to reveal pattern areas, transferring the pattern areas in the mask layer to the at least one scattering layer, transferring at least one of the pattern areas in the at least scattering layer to the membrane layer to produce a hybrid stencil/continuous membrane mask. Alternatively, all of the pattern areas in the at least one scattering layer are transferred to the membrane layer to produce a stencil mask.