The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2005
Filed:
Feb. 27, 2002
John Giles Langan, Pleasanton, CA (US);
Andrew David Johnson, Doylestown, PA (US);
John Giles Langan, Pleasanton, CA (US);
Andrew David Johnson, Doylestown, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
A method of using PFCs recovered from the effluent of a CVD chamber cleaning process as an influent for the cleaning process is provided which includes the steps of selecting a first PFC gas mixture having a first ratio of CFto CF, providing the first PFC gas mixture as the influent gas to the CVD chamber to create a CVD chamber effluent gas of a second PFC gas mixture having a second ratio of CFto CF, adding virgin CFor CFto the CVD chamber effluent gas in sufficient quantity to create a third PFC gas mixture having the first ratio of CFto CF, and using the third PFC gas mixture as the influent gas to the CVD chamber.