The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2004
Filed:
Mar. 07, 2003
Jörg-Achim Fischer, Laboe, DE (US);
Heidelberger Druckmaschinen AG, Heidelberg, DE;
Abstract
The method is for setting the line width of recorded image lines of a focused image beam in an exposer. The exposure point has a diameter and an area with a non-uniformly distributed power density. The recording material has a first exposure threshold and is exposed with an energy density near a second exposure threshold that is substantially higher than the first exposure threshold. The recording material can be a photopolymer printing plate. The line width of the recorded image lines is determined from the distribution of the power density over the area of the exposure point by integrating the time variation of the power density resulting from the exposure speed of the laser beam. The line width is set, by changing the diameter of the exposure point and/or by the laser power, such that the line width is substantially equal to the line spacing.