The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2004
Filed:
Dec. 30, 2002
Glenn Kornett, Bonneau, SC (US);
Albany International Corp., Albany, NY (US);
Abstract
A one-and-a-half layer monofilament fabric for use as a low-caliper seamed press fabric on a papermaking machine. The fabric is endless woven with seaming loops formed by adjacent unstacked MD wefts. The seaming loops are oriented perpendicular to the plane of the base fabric for easier connection and seaming. When the fabric is placed under load, the loops collapse back to produce a seam area having the same low caliper as the base fabric. Further, this unstacked fabric structure produces a larger web cake than other fabrics having a similar caliper.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile