The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 28, 2004

Filed:

May. 13, 2003
Applicant:
Inventor:

Keum-Joo Lee, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B 1/100 ;
U.S. Cl.
CPC ...
F26B 1/100 ;
Abstract

An apparatus for drying a wafer includes a rotating chuck configured to rotate the wafer. A movable de-ionized water supply member and an organic solvent supply member are positioned adjacent a face of the wafer. The de-ionized water supply member supplies de-ionized water onto the wafer, and the organic solvent supply member has a plurality of solvent supply nozzles disposed to supply an organic solvent onto the wafer. The organic solvent supply member includes a first solvent supply member and a second solvent supply member. The de-ionized water supply member and the first solvent supply member move radially between a position adjacent the central portion of the wafer and the edge portion of the wafer.


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