The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 2004

Filed:

Aug. 13, 2001
Applicant:
Inventors:

Thomas Maurer, Los Angeles, CA (US);

Hartmut Neven, Santa Monica, CA (US);

Bjoern Poehlker, Venice, CA (US);

Assignee:

Nevengineering, Inc., Santa Monica, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 ;
U.S. Cl.
CPC ...
G06K 9/00 ;
Abstract

The present invention relates to a technique for optimizing off-line facial feature tracking. Facial features in a sequence of image frames are automatically tracked while a visual indication is presented of the plurality of tracking node locations on the respective image frames. The sequence of image frames may be manually paused at a particular image frame in the sequence of image frames if the visual indication of the tracking node locations indicates that at least one location of a tracking node for a respective facial feature is not adequately tracking the respective facial feature. The location of the tracking node may be reinitialized by manually placing the tracking node location at a position on the particular image frame in the monitor window that corresponds to the respective facial feature. Automatic tracking of the facial feature may be continued based on the reinitialized tracking node location.


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