The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 2004
Filed:
Sep. 18, 2001
Jason Zweiback, Fremont, CA (US);
Joshua E. Rothenberg, San Jose, CA (US);
Jan Popelek, Fremont, CA (US);
Roger F. Caldwell, Mill Valley, CA (US);
Teraxion Inc., Sainte-Foy, CA;
Abstract
The invention reduces the effects of stitching errors from re-scaling or re-positioning in the fabrication of fiber Bragg gratings or the mask used in such fabrication. A first embodiment of the invention preferably uses characteristics of stitching errors to compensate for the stitching errors themselves. By increasing the number of stitching errors, errors caused by the stitching errors can be reduced. A second embodiment uses continuous writing of the desired pattern, wherein the desired pattern is snapped to a grid that can be written by the fabrication equipment. Using continuous writing eliminates stitching errors in the resulting gratings.