The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 2004
Filed:
Feb. 11, 2002
Craig A. Scheer, North Attleboro, MA (US);
John C. Stover, North Attleboro, MA (US);
The Scatter Works Inc., Tucson, AZ (US);
Abstract
In a method for depositing particles onto a substrate a flow of gas containing particles is provided along a flow path that bypasses a deposition chamber. The flow path may direct the flow of the gas containing the particles to a vacuum. To deposit particles onto a substrate in the deposition chamber, the flow path of the gas containing the particles is diverted into the deposition chamber so that particles are deposited onto the substrate. After a desired amount of particles have been deposited onto the substrate, the flow path of the flow of the gas containing the particles is changed to the flow path that bypasses the deposition chamber. A particle deposition system and a method for maintaining particle diameter during deposition of particles onto a substrate also are described.