The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 14, 2004

Filed:

Nov. 21, 2000
Applicant:
Inventors:

Yeqing Zhang, Penfield, NY (US);

Martin E. Banton, Fairport, NY (US);

James R. Low, Rochester, NY (US);

Steven J. Harrington, Webster, NY (US);

William A. Fuss, Rochester, NY (US);

Assignee:

Xerox Corporation, Stamford, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/42 ;
U.S. Cl.
CPC ...
G06K 9/42 ;
Abstract

An image processing method and system compensates for artifacts in scaling operations of mixed raster content data representations. In such data representations, a document is segmented into data portions generally segregated by data types. At least one of the segments is dilated so that upon scaling reconstruction, there are additional pixels available for interpolation operations, thereby avoiding artifacts caused by discontinuity.


Find Patent Forward Citations

Zhang, Yeqing. (2004). Method and system for compensating for scaling artifacts in mixed raster content (mrc) representations (U.S. Patent No. 6832007). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6832007

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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