The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 14, 2004

Filed:

Mar. 29, 2002
Applicant:
Inventors:

Jun Ye, Louisville, CO (US);

Henry C. Kapteyn, Boulder, CO (US);

John L. Hall, Boulder, CO (US);

Robert K. Shelton, Stillwater, OK (US);

Margaret Murnane, Boulder, CO (US);

Long-Sheng Ma, Shanghai, CN;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 3/098 ;
U.S. Cl.
CPC ...
H01S 3/098 ;
Abstract

Accurate and efficient synchronization of two pulsed radiation sources (e.g. iwo mode locked lasers) is accomplished in stages. Rough synchronization is accomplished by synchronizing (for example) the fundamental repetition rate of the two lasers. Fine synchronization is accomplished by synchronizing high harmonics of the two lasers. More accurate synchronization may be accomplished by adding more stages, by utilizing light out of a nonlinear laser in which the two beams are crossed, or by utilizing heterodyne beats of the two laser beams. A dc offset signal may added to the control signal generated by the synchronization stages.


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