The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2004
Filed:
Oct. 23, 2000
Applicant:
Inventors:
Zhifeng Sui, Milpitas, CA (US);
Hongqing Shan, Cupertino, CA (US);
Nils Johansson, Los Gatos, CA (US);
Hamid Noorbakhsh, Fremont, CA (US);
Yu Guan, San Jose, CA (US);
Assignee:
Applied Materials, Inc, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 4/00 ;
U.S. Cl.
CPC ...
G01J 4/00 ;
Abstract
A substrate processing apparatus comprises a chamber capable of processing a substrate , a radiation source to provide a radiation, a radiation polarizer adapted to polarize the radiation to one or more polarization angles that are selected in relation to an orientation of a feature being processed on the substrate , a radiation detector to detect radiation reflected from the substrate during processing and generate a signal, and a controller to process the signal.