The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 14, 2004

Filed:

Jun. 29, 1999
Applicant:
Inventors:

James T. Klosowski, Rye, NY (US);

Claudio T. Silva, Mahwah, NJ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 1/500 ;
U.S. Cl.
CPC ...
G06T 1/500 ;
Abstract

A technique and system for selecting level-of-detail representations of geometric models to be rendered within an image processing system. For each geometric model, fractional visibility estimations are computed, thereby ranking how likely it is that a model is visible. Using these rankings, an appropriate level-of-detail for each geometric model is selected to optimize the rendering process by reducing the number of primitives that need to be rendered, while preserving the quality of the final image produced and displayed upon the screen. Visibility estimates for the geometric models are summed to produce a number which is then used to scale the number of primitives used in the level-of-detail representation of the geometric models.


Find Patent Forward Citations

Quick Actions:

Klosowski, James. (2004). System and process for level of detail selection based on approximate visibility estimation (U.S. Patent No. 6831636). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6831636

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…