The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2004
Filed:
May. 20, 2002
Susumu Goto, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A blur and image distortion of an electron beam on a sample are reduced even at a large converging angle of the electron beam. A reduction projection optical system ( ) has an immersion lens ( ) on the image plane (wafer ) side. A collimator lens (pupil control optical system) is arranged between the reduction projection optical system ( ) and its object plane (mask ). The collimator lens ( ) arranges the entrance pupil ( ) of the reduction projection optical system ( ) at a finite position from the image plane on the downstream side of the image plane of the reduction projection optical system ( ). This can minimize any blur and image distortion of an electron beam on a sample.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile