The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 2004

Filed:

Sep. 30, 2002
Applicant:
Inventors:

Masao Katsumata, Tokyo, JP;

Hideki Yamamoto, Saitama, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/30 ;
U.S. Cl.
CPC ...
G02B 5/30 ;
Abstract

A prism optimally separating and synthesizing a light beam of a wide angle of incidence. A diffraction prism of the present invention is so constructed that a diffraction grid is sandwiched between a pair of diffraction grid substrates , a pair of prism substrates are bonded to the surfaces of the prism substrates facing the diffraction grid with interposition of adhesive layers , and a diffraction grid medium having a refractive index substantially equal to that of the prism substrates is charged in a gap defined by the diffraction grid and the prism substrates , with the respective component members being optically combined together. An incident light is led to the diffraction grid and separated on transmission or reflection by the operation of diffraction by the diffraction grid


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