The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2004
Filed:
Sep. 05, 2003
Kazuyuki Ueda, Tokyo, JP;
Kenji Niibori, Kanagawa, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Distances between spacers and electron passing apertures in potential regulation plate are regulated. An electron beam apparatus includes a first substrate having a region from which electrons are emitted, a second substrate having a region which is irradiated by the emitted electrons, spacers located between the first substrate and the second substrate for forming an atmospheric pressure resistant structure, and at least one potential regulation plate having aperture portions, through which electrons emitted from the first substrate pass, between the first substrate and the second substrate, wherein the potential regulation plate has recessed portions, to which the spacers fitted on, on one principal surface of the potential regulation plate, and a part of the other principal surface of the potential regulation plate abuts on the first substrate and/or the second substrate in the state in which the spacers are fitted to the recessed portions.