The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2004
Filed:
Apr. 29, 2002
Tadashi Nakano, Chiba, JP;
Kyoji Tokunaga, Chiba, JP;
Kawasaki Microelectronics, Inc., Chiba, JP;
Abstract
An insulating film which enables not only to obtain a good film quality but to achieve an excellent filling property, thick film formation and planarization simultaneously, an insulating film forming coating solution for forming the insulating film, and a method of manufacturing the insulating film are set forth. An insulating film forming coating solution containing as a main component a solution of a polymer obtained by co-hydrolysis of trialkoxysilane expressed by a general formula, SiH(OR) —, methyltrialkoxysilane expressed by a general formula, SiCH (OR) —, and tetraalkoxysilane expressed by a general formula, Si(OR) is coated on a semiconductor substrate ( ) having a step portion, and after it is heated and dried in an inert gas atmosphere, an insulating film ( ) which is composed of a silane-derived compound expressed by a general formula, SiH (CH ) O , where, 0<x<1, 0<y<1, x+y≦1 is formed.