The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2004
Filed:
Sep. 12, 2001
Denwood F. Ross, Austinburg, OH (US);
Josef Bille, Heidelberg, DE;
Michael Schottner, Liemen, DE;
Frank Mueller, Speyer, DE;
Other;
Abstract
Apparatuses and methods for improving aberration determination capabilities, providing corrective prescription verification, and allowing binocular vision correction in ophthalmic wavefront measuring devices. (1) Improved aberration determination capabilities are achieved through input beam modification which includes sensing an image in a wavefront emanating from an eye in response to an input beam with a sensor and then modifying the input beam with an adaptive optical device based on the sensed information. (2) Corrective prescription verification includes modifying an image with an adaptive optical element to produce a corrected image at the patients eye. (3) Binocular vision correction for a pair of eyes includes measuring the aberrations of one eye with a first ophthalmic wavefront measuring device and measuring the aberration produced by the other eye with a second ophthalmic wavefront measuring device substantially simultaneously.