The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2004
Filed:
May. 22, 2000
Lawrence E. Myers, Palo Alto, CA (US);
Jason I. Alexander, Foster City, CA (US);
Lightwave Electronics Corporation, Mountain View, CA (US);
Abstract
A Saturable Reflector apparatus comprises a substrate having a first and second surfaces, and a reflector having a saturable absorber layer, attached to the first surface. At least one of the first and second surfaces has been modified to enhance an etalon effect of the substrate due to interference of light reflecting from the first and second surfaces. Either or both of the surfaces may be modified, for example, by polishing or coating. The apparatus may also include means for adjusting an optical thickness of the substrate to tune the etalon effect. Such means may comprise a temperature control element, such as a heater, coupled to a temperature controller. The inventive apparatus may be incorporated into a mode-locked laser. The etalon tuning optimizes a relation between temporal and frequency domains of radiation incident on the saturable reflector.