The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2004
Filed:
Aug. 30, 2002
Nobuhiro Kanaya, Sakata, JP;
Seiko Epson Corporation, , JP;
Abstract
A mask for manufacturing a semiconductor device in accordance with the present invention is equipped with a first mask having separated patterns and a second mask having dense patterns, wherein the first mask and the second mask are exposed under respectively independent illumination conditions to transfer one set of exposure patterns. The first mask includes only isolated patterns wherein adjacent ones thereof do not overlap one another when design data for the exposure patterns is enlarged at a specified magnification, and the second mask includes only dense patterns wherein adjacent ones thereof overlap one another when the design data for the exposure patterns is enlarged at a specified magnification.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile